DocumentCode :
2037038
Title :
Optical spectroscopy of CH/sub 4//H/sub 2/ and C/sub 2/H/sub 2//H/sub 2/ plasma generated in an RF planar coil inductively coupled plasma system used for CVD diamond deposition
Author :
Tan, C.H. ; Ng, K.H. ; Nor, R.M. ; Wong, C.S.
Author_Institution :
Dept. of Phys., Kuala Lumpur, Malaysia
fYear :
2003
fDate :
5-5 June 2003
Firstpage :
412
Abstract :
Summary form only given, as follows. One of the main issues concerning the use of low temperature plasmas to synthesize diamond films is the composition of the reactive species during the deposition process. Due to this, the gas mix ratio of the carbon containing species to hydrogen is a key experimental parameter that will determine the conditions suitable for diamond growth.
Keywords :
diamond; elemental semiconductors; hydrogen neutral molecules; organic compounds; plasma CVD; plasma diagnostics; semiconductor growth; visible spectra; C; CVD diamond deposition; RF planar coil inductively coupled plasma; acetylene/H/sub 2/ plasma; gas mix ratio; low temperature plasmas; methane/H/sub 2/ plasma; optical spectra; reactive species; Coatings; Feeds; Nuclear and plasma sciences; Optical coupling; Optical films; Plasma measurements; Plasma temperature; Polymer films; Radio frequency; Spectroscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
ISSN :
0730-9244
Print_ISBN :
0-7803-7911-X
Type :
conf
DOI :
10.1109/PLASMA.2003.1229965
Filename :
1229965
Link To Document :
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