• DocumentCode
    2037339
  • Title

    Evolution of surface micro-features on titanium nitride films deposited using plasma vacuum arc methods

  • Author

    Li, L.H. ; Chu, Paul K. ; Kwok, S.C.H. ; Wu, Y.Q. ; Zhang, Yong Hong

  • Author_Institution
    Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, China
  • fYear
    2003
  • fDate
    5-5 June 2003
  • Firstpage
    418
  • Abstract
    Summary form only given, as follows. Titanium nitride (TiN) thin films possess excellent wear resistance, a golden color, and other desirable properties. They are therefore quite common in industrial parts and components TiN films can be fabricated by many methods among which vacuum arc plasma deposition is gaining popularity because of the ease to adjust the processing parameters and the high deposition rate. In order to retain the high efficiency in industrial applications, magnetic filters are not frequently used and macro-particles emitted from the source can contaminate the samples.
  • Keywords
    crystal microstructure; plasma deposition; surface topography; titanium compounds; vacuum deposition; wear resistant coatings; TiN; plasma vacuum arc methods; surface microfeatures; thin films; wear resistance; Magnetic films; Plasma applications; Plasma materials processing; Plasma properties; Surface resistance; Textile industry; Tin; Titanium; Transistors; Vacuum arcs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
  • Conference_Location
    Jeju, South Korea
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-7911-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2003.1229978
  • Filename
    1229978