Title :
Evolution of surface micro-features on titanium nitride films deposited using plasma vacuum arc methods
Author :
Li, L.H. ; Chu, Paul K. ; Kwok, S.C.H. ; Wu, Y.Q. ; Zhang, Yong Hong
Author_Institution :
Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, China
Abstract :
Summary form only given, as follows. Titanium nitride (TiN) thin films possess excellent wear resistance, a golden color, and other desirable properties. They are therefore quite common in industrial parts and components TiN films can be fabricated by many methods among which vacuum arc plasma deposition is gaining popularity because of the ease to adjust the processing parameters and the high deposition rate. In order to retain the high efficiency in industrial applications, magnetic filters are not frequently used and macro-particles emitted from the source can contaminate the samples.
Keywords :
crystal microstructure; plasma deposition; surface topography; titanium compounds; vacuum deposition; wear resistant coatings; TiN; plasma vacuum arc methods; surface microfeatures; thin films; wear resistance; Magnetic films; Plasma applications; Plasma materials processing; Plasma properties; Surface resistance; Textile industry; Tin; Titanium; Transistors; Vacuum arcs;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229978