DocumentCode
2037339
Title
Evolution of surface micro-features on titanium nitride films deposited using plasma vacuum arc methods
Author
Li, L.H. ; Chu, Paul K. ; Kwok, S.C.H. ; Wu, Y.Q. ; Zhang, Yong Hong
Author_Institution
Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon, China
fYear
2003
fDate
5-5 June 2003
Firstpage
418
Abstract
Summary form only given, as follows. Titanium nitride (TiN) thin films possess excellent wear resistance, a golden color, and other desirable properties. They are therefore quite common in industrial parts and components TiN films can be fabricated by many methods among which vacuum arc plasma deposition is gaining popularity because of the ease to adjust the processing parameters and the high deposition rate. In order to retain the high efficiency in industrial applications, magnetic filters are not frequently used and macro-particles emitted from the source can contaminate the samples.
Keywords
crystal microstructure; plasma deposition; surface topography; titanium compounds; vacuum deposition; wear resistant coatings; TiN; plasma vacuum arc methods; surface microfeatures; thin films; wear resistance; Magnetic films; Plasma applications; Plasma materials processing; Plasma properties; Surface resistance; Textile industry; Tin; Titanium; Transistors; Vacuum arcs;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1229978
Filename
1229978
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