Title :
Interaction of processing ion beams with background plasmas and neutrals
Author :
Boehmer, H. ; Edrich, D. ; Heidbrink, W. ; McWilliams, R. ; Zhao, Lu
Author_Institution :
Dept. of Phys., California Univ., Irvine, CA, USA
Abstract :
Summary form only given, as follows. We report studies of argon ion beam current density and beam profile at various distances from an Ion Tech 3 cm RF ion beam source in different background neutral and background plasmas in magnetic fields and field-free chambers.
Keywords :
ion beam applications; ion sources; plasma sources; 3 cm; Ar; Ion Tech RF ion beam source; background plasmas; beam profile; field-free chambers; ion beam current density; magnetic fields; neutrals; processing ion beams interaction; Electrons; Impedance; Ion beams; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Plasma properties; Plasma sources; Radio frequency;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229984
