Title :
EEDF measurements in dual frequency capacitively coupled plasma (CCP) and comparison with PIC simulation
Author :
Jeon, B.I. ; Chang, H.Y.
Author_Institution :
Dept. of Phys., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Abstract :
Summary form only given, as follows. Summary form only given. Electron Energy Distribution Functions (EEDFs) have been measured in a very narrow electrode gap (20 mm) dual frequency Capacitively Coupled Plasma (CCP). The problems when we measured EEDF in this very narrow gap dual frequency operation CCP were solved in this experiments. Measured EEDF was compared with Particle In Cell simulation results.
Keywords :
discharges (electric); plasma simulation; electron energy distribution functions; particle in cell simulation; very narrow electrode gap dual frequency capacitively coupled plasma; Electrodes; Electrons; Frequency measurement; Nuclear and plasma sciences; Physics; Plasma density; Plasma measurements; Plasma properties; Plasma simulation; Radio frequency;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229987
