Title :
Shadowgraphic studies of DLC film deposition process in dense plasma focus device
Author :
Soh, L.Y. ; Lee, P. ; Shuyan, X. ; Lee, Sang-Rim ; Rawat, R.S.
Author_Institution :
Natural Sci., Nat. Inst. of Educ., Singapore
Abstract :
Summary form only given, as follows. The 3.3 kJ dense plasma focus (DPF) device is used to deposit diamond-like carbon (DLC) thin films on corning and silicon substrates by ablating the high purity graphite anode. For deposition of DLC thin films, the conventional central hollow copper anode is fitted with a solid graphite top, which is 3 cm long.
Keywords :
diamond-like carbon; plasma deposition; plasma focus; 3 cm; 3.3 kJ; C; DLC film deposition process; Si; dense plasma focus; diamond-like carbon; high purity graphite anode; shadowgraphic studies; Anodes; Copper; Diamond-like carbon; Plasma density; Plasma devices; Semiconductor thin films; Silicon; Sputtering; Substrates; Thin film devices;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1230048
