3D simulations of an industrial ICP reactor with comparison to experimental data

Summary form only given, as follows. Coil design and gas flow patterns determine spatial uniformity of plasma and its composition in inductively coupled plasma (ICP) reactors for semiconductor manufacturing. Attempts of 3D ICP simulations have been reported over the last few years, however these simulations have remained a difficult and time-consuming task. We have performed 3D simulations of an industrial ICP reactor (Panasonic Pantheon E800 Dry Etcher) using a filament model to set up complicated multi-spiral RF coil and gas injectors.