Phasing effects of dual RF voltage waves on plasma properties in a capacitively coupled plasma reactor

Summary form only given, as follows. In the plasma processing of electronic materials, it is common practice to control plasma density and ion bombardment energy by manipulating excitation voltage and frequency. In such applications, an appropriate combination of excitation frequency and RF power is required to accurately control ion flux and bombardment energy at the substrate surface. We investigate the effects of phase differences between excitation voltage waves simultaneously imposed, through blocking capacitors, on primary and secondary electrodes at the various combinations of commensurate frequencies by the simulations of a self-consistent, three-moment plasma model.