Title :
High-silica guided-wave optical devices
Author :
Imoto, Katsuyuki ; Uetsuka, Hisato ; Kashimura, Seiichi
Author_Institution :
Hitachi Cable Ltd., Ibaraki, Japan
Abstract :
A high-silica embedded channel waveguide with low loss and high precision structure has been fabricated using low-temperature glass formation, lithography, reactive ion etching, and a flame hydrolysis glass deposition processes. Fusion splicing of the waveguide and single-mode fiber has also been achieved by CO2 laser beam irradiation. Furthermore, this waveguide structure can be applied to many devices such as multi/demultiplexers, star couplers, and hybrid integration of optical active components
Keywords :
integrated optics; multiplexing equipment; optical communication equipment; optical couplers; optical waveguides; optical workshop techniques; photolithography; silicon compounds; sputter etching; CO2 laser beam irradiation; SiO2 waveguide; demultiplexers; embedded channel waveguide; fibre channel waveguide splicing; flame hydrolysis glass deposition; fusion splicing; guided-wave optical devices; hybrid integration of optical active components; lithography; low loss waveguide; low-temperature glass formation; multiplexers; precision structure; reactive ion etching; star couplers; Etching; Fires; Glass; Lithography; Optical devices; Optical fiber couplers; Optical fiber devices; Optical losses; Optical waveguides; Splicing;
Conference_Titel :
Electronic Components and Technology Conference, 1991. Proceedings., 41st
Conference_Location :
Atlanta, GA
Print_ISBN :
0-7803-0012-2
DOI :
10.1109/ECTC.1991.163920
