DocumentCode :
2039381
Title :
Study on RF magnetron discharges of oxygen/argon mixture by the particle-in-cell/Monte Carlo method
Author :
Yonemura, S. ; Nanbu, K.
Author_Institution :
Inst. of Fluid Sci., Tohoku Univ., Sendai, Japan
fYear :
2003
fDate :
5-5 June 2003
Firstpage :
462
Abstract :
Summary form only given, as follows. The characteristics of rf planar magnetron discharges of O/sub 2//Ar mixture are clarified using the Particle-in-Cell/Monte Carlo (PIC/MC) method. The simulation is carried out for axisymmetrical magnetic fields. The spatial and temporal behavior of magnetron discharge is examined in detail. The total pressure and temperature of mixture gas are 5mTorr and 323K, respectively The voltage amplitude is 200V. The magnetization in the magnets is 0.25T. We change mole fraction X/sub O2/ of oxygen. The O/sup -/ ions are trapped in the plasma bulk by the time-averaged potential The spatial distribution of the density of O/sup -/ ions is governed by a balance of generation and loss of O/sup -/. The positive ions Ar, O/sub 2//sup +/, and O/sup +/ are distributed in such a way that the charge neutrality is kept in the plasma bulk. Consequently, the spatial distributions of Ar/sup +/, O/sub 2//sup +/, and O/sup +/ have two peaks. The number densities of Ar/sup +/ and O/sup -/ ions drastically increase when oxygen is added to the discharge gas Ar. In the case when mole fraction X/sub O2/ of oxygen increases, the self-bias voltage on the target decreases. This phenomenon is investigated in detail and a, clear physical explanation is presented.
Keywords :
Monte Carlo methods; argon; gas mixtures; high-frequency discharges; oxygen; plasma density; plasma simulation; 323 K; 5 mtorr; O/sub 2/-Ar; RF planar magnetron discharges; axisymmetrical magnetic fields; ions density; number density distributions; particle-in-cell Monte Carlo Method; self-bias voltage; spatial behavior; temporal behavior; time-averaged potential; total pressure; total temperature; Argon; Oxygen; Radio frequency; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
ISSN :
0730-9244
Print_ISBN :
0-7803-7911-X
Type :
conf
DOI :
10.1109/PLASMA.2003.1230058
Filename :
1230058
Link To Document :
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