• DocumentCode
    2040534
  • Title

    Integrated 1.55 μm and 1.3 μm DFB laser-electro absorption modulators with identical active layer structure composed of two QW types

  • Author

    Stegmueller, B. ; Gessner, R. ; Kunkel, F. ; Rieger, J. ; Schier, M. ; Walter, J. ; Baur, E.

  • Author_Institution
    Corporate Res. Photonics, Infineon Technol. AG, Munich, Germany
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    9
  • Lastpage
    12
  • Abstract
    We report the improved performance of a monolithically integrated 1.55 μm ridge waveguide DFB laserdiode with an electro absorption modulator using the identical active multiple quantum layer structure composed of two different quantum well types. For the first time, this approach was successfully transferred to devices operating at 1.3 μm. Minimum threshold currents of 20 mA and 17 mA are obtained for 1.55 μm and 1.3 μm devices, respectively. With a voltage swing of 1.5 V, we achieve an extinction ratio ≥10 dB and the 3-dBe cutoff frequency of 200 μm long modulators exceeds 15 GHz.
  • Keywords
    distributed feedback lasers; electro-optical modulation; electroabsorption; integrated optics; quantum well lasers; waveguide lasers; 1.3 micron; 1.55 micron; 15 GHz; 17 mA; 20 mA; cutoff frequency; electroabsorption modulator; extinction ratio; monolithic integration; multiple quantum well active layer structure; ridge waveguide DFB laser diode; threshold current; Absorption; Chemical lasers; Epitaxial growth; Holographic optical components; Holography; Indium phosphide; Laser tuning; Optical device fabrication; Quantum well devices; Threshold current;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
  • Print_ISBN
    0-7803-6698-0
  • Type

    conf

  • DOI
    10.1109/COMMAD.2000.1022881
  • Filename
    1022881