DocumentCode
2040534
Title
Integrated 1.55 μm and 1.3 μm DFB laser-electro absorption modulators with identical active layer structure composed of two QW types
Author
Stegmueller, B. ; Gessner, R. ; Kunkel, F. ; Rieger, J. ; Schier, M. ; Walter, J. ; Baur, E.
Author_Institution
Corporate Res. Photonics, Infineon Technol. AG, Munich, Germany
fYear
2000
fDate
2000
Firstpage
9
Lastpage
12
Abstract
We report the improved performance of a monolithically integrated 1.55 μm ridge waveguide DFB laserdiode with an electro absorption modulator using the identical active multiple quantum layer structure composed of two different quantum well types. For the first time, this approach was successfully transferred to devices operating at 1.3 μm. Minimum threshold currents of 20 mA and 17 mA are obtained for 1.55 μm and 1.3 μm devices, respectively. With a voltage swing of 1.5 V, we achieve an extinction ratio ≥10 dB and the 3-dBe cutoff frequency of 200 μm long modulators exceeds 15 GHz.
Keywords
distributed feedback lasers; electro-optical modulation; electroabsorption; integrated optics; quantum well lasers; waveguide lasers; 1.3 micron; 1.55 micron; 15 GHz; 17 mA; 20 mA; cutoff frequency; electroabsorption modulator; extinction ratio; monolithic integration; multiple quantum well active layer structure; ridge waveguide DFB laser diode; threshold current; Absorption; Chemical lasers; Epitaxial growth; Holographic optical components; Holography; Indium phosphide; Laser tuning; Optical device fabrication; Quantum well devices; Threshold current;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
Print_ISBN
0-7803-6698-0
Type
conf
DOI
10.1109/COMMAD.2000.1022881
Filename
1022881
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