• DocumentCode
    2041887
  • Title

    Radius of curvature in MBE grown heterostructures

  • Author

    Dieing, T. ; Usher, B.F.

  • Author_Institution
    Dept. of Electron. Eng., La Trobe Univ., Bundoora, Vic., Australia
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    214
  • Lastpage
    217
  • Abstract
    Misfit stress in MBE grown heterostructures causes these structures to bend. Former theories on semiconductor wafer curvature have been re-examined and errors that have persisted in the literature have been corrected. We present an approach to describe the wafer curvature of strained layer systems using basic physical equations. A description of the position of the neutral plane for epitaxial heterostructures is presented. Wafer curvature has been studied using X-ray diffraction and the results are in good agreement with the theory.
  • Keywords
    X-ray diffraction; bending; internal stresses; molecular beam epitaxial growth; multilayers; semiconductor epitaxial layers; AlAs; GaAs; InGaAs; MBE grown heterostructures; X-ray diffraction; bending; curvature radius; epitaxial heterostructures; misfit stress; neutral plane; semiconductor wafer curvature; strained layer systems; Capacitive sensors; Epitaxial layers; Equations; Error correction; Gallium arsenide; Lattices; Molecular beam epitaxial growth; Stress; Substrates; X-ray diffraction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
  • Print_ISBN
    0-7803-6698-0
  • Type

    conf

  • DOI
    10.1109/COMMAD.2000.1022930
  • Filename
    1022930