DocumentCode
2041887
Title
Radius of curvature in MBE grown heterostructures
Author
Dieing, T. ; Usher, B.F.
Author_Institution
Dept. of Electron. Eng., La Trobe Univ., Bundoora, Vic., Australia
fYear
2000
fDate
2000
Firstpage
214
Lastpage
217
Abstract
Misfit stress in MBE grown heterostructures causes these structures to bend. Former theories on semiconductor wafer curvature have been re-examined and errors that have persisted in the literature have been corrected. We present an approach to describe the wafer curvature of strained layer systems using basic physical equations. A description of the position of the neutral plane for epitaxial heterostructures is presented. Wafer curvature has been studied using X-ray diffraction and the results are in good agreement with the theory.
Keywords
X-ray diffraction; bending; internal stresses; molecular beam epitaxial growth; multilayers; semiconductor epitaxial layers; AlAs; GaAs; InGaAs; MBE grown heterostructures; X-ray diffraction; bending; curvature radius; epitaxial heterostructures; misfit stress; neutral plane; semiconductor wafer curvature; strained layer systems; Capacitive sensors; Epitaxial layers; Equations; Error correction; Gallium arsenide; Lattices; Molecular beam epitaxial growth; Stress; Substrates; X-ray diffraction;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
Print_ISBN
0-7803-6698-0
Type
conf
DOI
10.1109/COMMAD.2000.1022930
Filename
1022930
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