DocumentCode :
2042914
Title :
Regularities of formation of silver/porous silicon nanostructures for Surface Enhanced Raman Scattering
Author :
Artemyeva, K.V. ; Bondarenko, H.V. ; Bondarenko, V.P. ; Panarin, A.Yu. ; Terekhov, S.N.
Author_Institution :
Belarusian State Univ. of Inf. & Radioelectron., Minsk, Belarus
fYear :
2013
fDate :
8-14 Sept. 2013
Firstpage :
834
Lastpage :
835
Abstract :
This paper presents results of investigation of formation regularities of nanostructures produced at different modes of immersion deposition onto porous silicon for their use as active substrates in Surface-Enhanced Raman Scattering (SERS). Porous silicon samples were formed by anodization of monocrystalline n+-Si in water-alcohol solution of fluorhydric acid HF. It has been found that the intensity of SERS signal depends significantly on the morphology of nanostructured silver films which in turn depends on the silver salt concentration in the solution for immersion deposition and by the immersion period. Optimal modes of silver depositing have been revealed which made it possible to produce SERS-active substrates allowing reaching the detection limit for copper porphyrin to be 1×10-11 M of analyte.
Keywords :
nanostructured materials; surface enhanced Raman scattering; SERS active substrates; anodization; copper porphyrin; fluorhydric acid HF; formation regularities; immersion deposition; immersion period; monocrystalline; morphology; nanostructured silver films; porous silicon nanostructures; silver salt concentration; silver silicon nanostructures; surface enhanced Raman scattering; water alcohol solution; Nanostructures; Raman scattering; Silicon; Silver; Substrates; Surface morphology; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Telecommunication Technology (CriMiCo), 2013 23rd International Crimean Conference
Conference_Location :
Sevastopol
Print_ISBN :
978-966-335-395-1
Type :
conf
Filename :
6653085
Link To Document :
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