DocumentCode
2043191
Title
Nano imprint technology with artificially assisted self-assembling patterns for recording media
Author
Kikitsu, A. ; Morita, S. ; Hieda, H. ; Sakurai, M. ; Kamata, Y. ; Naito, K. ; Asakawa, K.
Author_Institution
Toshiba Corp., Kawasaki, Japan
fYear
2003
fDate
March 30 2003-April 3 2003
Abstract
In this paper, we have developed a new fabricating method of patterned media which includes nano-imprint lithography and fine nano-patterning using the self-assembly of diblock copolymer.
Keywords
chromium alloys; cobalt alloys; ferromagnetic materials; magnetic hysteresis; magnetic recording; magnetic thin films; nanolithography; platinum alloys; polymer blends; CoCrPt; artificially assisted self-assembling patterns; diblock copolymer; ferromagnetic materials; magnetic hysteresis; nanoimprint lithography; nanoimprint technology; recording media; Anisotropic magnetoresistance; Costs; Disk recording; Glass; Magnetic anisotropy; Magnetic force microscopy; Manufacturing; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Self-assembly;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7647-1
Type
conf
DOI
10.1109/INTMAG.2003.1230329
Filename
1230329
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