Title :
Nano imprint technology with artificially assisted self-assembling patterns for recording media
Author :
Kikitsu, A. ; Morita, S. ; Hieda, H. ; Sakurai, M. ; Kamata, Y. ; Naito, K. ; Asakawa, K.
Author_Institution :
Toshiba Corp., Kawasaki, Japan
fDate :
March 30 2003-April 3 2003
Abstract :
In this paper, we have developed a new fabricating method of patterned media which includes nano-imprint lithography and fine nano-patterning using the self-assembly of diblock copolymer.
Keywords :
chromium alloys; cobalt alloys; ferromagnetic materials; magnetic hysteresis; magnetic recording; magnetic thin films; nanolithography; platinum alloys; polymer blends; CoCrPt; artificially assisted self-assembling patterns; diblock copolymer; ferromagnetic materials; magnetic hysteresis; nanoimprint lithography; nanoimprint technology; recording media; Anisotropic magnetoresistance; Costs; Disk recording; Glass; Magnetic anisotropy; Magnetic force microscopy; Manufacturing; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Self-assembly;
Conference_Titel :
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7647-1
DOI :
10.1109/INTMAG.2003.1230329
