DocumentCode
2043620
Title
Dislocation configurations in strained single-heterostructure layers
Author
Madebo, M. ; Usher, B.F.
Author_Institution
Dept. of Electron. Eng., La Trobe Univ., Bundoora, Vic., Australia
fYear
2000
fDate
2000
Firstpage
471
Lastpage
474
Abstract
Detailed force-balance considerations can lead to a description of the dislocation configuration within a strained layer. Dislocation configurations are of interest because critical thicknesses of epitaxially grown layers depend on the evolution of the configuration of threading dislocations. Moreover, it promises to shed light on investigations of critical thickness criteria for Multiple Quantum Well (MQW) structures. This paper reports a theoretical study of dislocation configurations in structures by examining the forces acting on a dislocation segment and developing governing equations to describe the equilibrium structure as a function of layer strain and thickness.
Keywords
dislocations; semiconductor epitaxial layers; semiconductor heterojunctions; semiconductor quantum wells; critical thickness; dislocation configuration; equilibrium structure; force balance model; multiple quantum well structures; strained single-heterostructure layers; threading dislocations; Atmosphere; Capacitive sensors; Equations; Geometry; III-V semiconductor materials; Iron; Shape; Stress; Surface tension; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
Print_ISBN
0-7803-6698-0
Type
conf
DOI
10.1109/COMMAD.2000.1022992
Filename
1022992
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