• DocumentCode
    2043620
  • Title

    Dislocation configurations in strained single-heterostructure layers

  • Author

    Madebo, M. ; Usher, B.F.

  • Author_Institution
    Dept. of Electron. Eng., La Trobe Univ., Bundoora, Vic., Australia
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    471
  • Lastpage
    474
  • Abstract
    Detailed force-balance considerations can lead to a description of the dislocation configuration within a strained layer. Dislocation configurations are of interest because critical thicknesses of epitaxially grown layers depend on the evolution of the configuration of threading dislocations. Moreover, it promises to shed light on investigations of critical thickness criteria for Multiple Quantum Well (MQW) structures. This paper reports a theoretical study of dislocation configurations in structures by examining the forces acting on a dislocation segment and developing governing equations to describe the equilibrium structure as a function of layer strain and thickness.
  • Keywords
    dislocations; semiconductor epitaxial layers; semiconductor heterojunctions; semiconductor quantum wells; critical thickness; dislocation configuration; equilibrium structure; force balance model; multiple quantum well structures; strained single-heterostructure layers; threading dislocations; Atmosphere; Capacitive sensors; Equations; Geometry; III-V semiconductor materials; Iron; Shape; Stress; Surface tension; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
  • Print_ISBN
    0-7803-6698-0
  • Type

    conf

  • DOI
    10.1109/COMMAD.2000.1022992
  • Filename
    1022992