• DocumentCode
    2044566
  • Title

    Thermal Model of Miniaturized Schottky Emitter for Parallel Electron Beam Lithography

  • Author

    Dokania, A.K. ; Velthuis, J.F.M. ; Zhang, Yanxia ; Kruit, Pieter

  • Author_Institution
    Charged Particle Opt., Delft Univ. of Technol.
  • fYear
    2006
  • fDate
    38899
  • Firstpage
    393
  • Lastpage
    394
  • Abstract
    This paper investigates the possibility of creating an array of Schottky emitters for use in parallel electron beam lithography. The Schottky source consists of a tiny single crystal W wire spot-welded on a heating filament for heating up to 1800 K. By designing the dimensions of the heating filament and choosing the best material, current etc, the emitter is optimized in a such a way that the temperature at the tip could be at 1800 K, without raising the temperature in surroundings significantly. In the proposed array design, 200 Schottky emitters will be arranged within the dimension of 30 times 30 mm and each beam from a source is further split into 100 beamlets
  • Keywords
    Schottky effect; field emitter arrays; tungsten; 1800 K; Schottky emitter array; Schottky source; W; heating filament; parallel electron beam lithography; single crystal wire; thermal model; Electron beams; Electron optics; Heating; Laboratories; Lithography; Moore´s Law; Stimulated emission; Temperature distribution; Thermal conductivity; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
  • Conference_Location
    Guilin
  • Print_ISBN
    1-4244-0401-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2006.335233
  • Filename
    4134625