DocumentCode :
2045297
Title :
Study of the Influence of the Thickness of Dielectric Layer in a FED
Author :
Su, Xing ; Zhang, Lifang ; Lei, Wei ; Zhang, Xiaobing
Author_Institution :
Dept. of Electron. Eng., Southeast Univ., Nanjing
fYear :
2006
fDate :
38899
Firstpage :
451
Lastpage :
452
Abstract :
In our experiments a normal gate FED was fabricated by screen printing method, obtaining the spot size and brightness uniformity on the screen in the vacuum chamber. Then we measured the dielectric layer´s thickness. From the measurement results, the fluctuation of the dielectric layer is found. A simulation model is also constructed to analyze the sensitivity of the thickness of the dielectric layer on the brightness uniformity
Keywords :
field emission displays; FED; dielectric layer; dielectric layer thickness; field emission display; screen printing method; vacuum chamber; Analytical models; Anodes; Brightness; Dielectric films; Dielectric measurements; Fabrication; Flat panel displays; Fluctuations; Printing; Thickness measurement; Dielectric layer; Field emission display; Film uniformity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location :
Guilin
Print_ISBN :
1-4244-0401-0
Type :
conf
DOI :
10.1109/IVNC.2006.335262
Filename :
4134654
Link To Document :
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