• DocumentCode
    2045565
  • Title

    Multipactor Discharge in a Dielectric-loaded Accelerating Structure

  • Author

    Lin, Wu ; Ang, L.K.

  • Author_Institution
    Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ.
  • fYear
    2006
  • fDate
    38899
  • Firstpage
    467
  • Lastpage
    468
  • Abstract
    The model of multipactor discharge was extended on a simple rf window to describe the electron multiplication and its power deposited in dielectric-loaded accelerating structures due to secondary electron emissions by developing the susceptibility diagram and dynamic models for such structures. Both static (constant electric fields) and dynamic calculations (changeable electric fields) were performed using Monte Carlo simulations with random distributions in the emission velocities and emission angles of the secondary electrons, taking realistic secondary electron yield curves as input
  • Keywords
    Monte Carlo methods; discharges (electric); optical susceptibility; secondary electron emission; Monte Carlo simulations; changeable electric fields; constant electric fields; dielectric-loaded accelerating structures; dynamic calculations; electron multiplication; electron power; multipactor discharge model; random emission angle distribution; random emission velocity distribution; rf window; secondary electron emissions; secondary electron yield curves; static calculations; susceptibility diagram; Acceleration; Dielectric materials; Electron emission; Electronic equipment testing; Gold; High performance computing; Life estimation; Load flow; Power engineering and energy; Surface discharges;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
  • Conference_Location
    Guilin
  • Print_ISBN
    1-4244-0401-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2006.335270
  • Filename
    4134662