DocumentCode :
2045565
Title :
Multipactor Discharge in a Dielectric-loaded Accelerating Structure
Author :
Lin, Wu ; Ang, L.K.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ.
fYear :
2006
fDate :
38899
Firstpage :
467
Lastpage :
468
Abstract :
The model of multipactor discharge was extended on a simple rf window to describe the electron multiplication and its power deposited in dielectric-loaded accelerating structures due to secondary electron emissions by developing the susceptibility diagram and dynamic models for such structures. Both static (constant electric fields) and dynamic calculations (changeable electric fields) were performed using Monte Carlo simulations with random distributions in the emission velocities and emission angles of the secondary electrons, taking realistic secondary electron yield curves as input
Keywords :
Monte Carlo methods; discharges (electric); optical susceptibility; secondary electron emission; Monte Carlo simulations; changeable electric fields; constant electric fields; dielectric-loaded accelerating structures; dynamic calculations; electron multiplication; electron power; multipactor discharge model; random emission angle distribution; random emission velocity distribution; rf window; secondary electron emissions; secondary electron yield curves; static calculations; susceptibility diagram; Acceleration; Dielectric materials; Electron emission; Electronic equipment testing; Gold; High performance computing; Life estimation; Load flow; Power engineering and energy; Surface discharges;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location :
Guilin
Print_ISBN :
1-4244-0401-0
Type :
conf
DOI :
10.1109/IVNC.2006.335270
Filename :
4134662
Link To Document :
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