DocumentCode
2045565
Title
Multipactor Discharge in a Dielectric-loaded Accelerating Structure
Author
Lin, Wu ; Ang, L.K.
Author_Institution
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ.
fYear
2006
fDate
38899
Firstpage
467
Lastpage
468
Abstract
The model of multipactor discharge was extended on a simple rf window to describe the electron multiplication and its power deposited in dielectric-loaded accelerating structures due to secondary electron emissions by developing the susceptibility diagram and dynamic models for such structures. Both static (constant electric fields) and dynamic calculations (changeable electric fields) were performed using Monte Carlo simulations with random distributions in the emission velocities and emission angles of the secondary electrons, taking realistic secondary electron yield curves as input
Keywords
Monte Carlo methods; discharges (electric); optical susceptibility; secondary electron emission; Monte Carlo simulations; changeable electric fields; constant electric fields; dielectric-loaded accelerating structures; dynamic calculations; electron multiplication; electron power; multipactor discharge model; random emission angle distribution; random emission velocity distribution; rf window; secondary electron emissions; secondary electron yield curves; static calculations; susceptibility diagram; Acceleration; Dielectric materials; Electron emission; Electronic equipment testing; Gold; High performance computing; Life estimation; Load flow; Power engineering and energy; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location
Guilin
Print_ISBN
1-4244-0401-0
Type
conf
DOI
10.1109/IVNC.2006.335270
Filename
4134662
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