• DocumentCode
    2045778
  • Title

    Study of Application Penetrating Surface Method in SEM to Detect IC with Insulator Layer Si3N4+ SiO2

  • Author

    Hu, Wengue ; Xiao, Ling ; Lin, Yiping ; Liang, Zhuguan ; Li, Yawen ; Li, Ping ; Lan, Dechun ; Wang, Jian ; Zhou, Kailin ; Rau, E.I.

  • Author_Institution
    Phys. & Technol. Coll., Yunnan Univ., Kunming
  • fYear
    2006
  • fDate
    38899
  • Firstpage
    487
  • Lastpage
    488
  • Abstract
    Two novel detectors are developed to detect semiconductor materials and integrated circuits: (1) the electron beam nondestructive microscopic perspective method (detector), the perspective method (detector); (2) the electron beam nondestructive microscopic layered method (detector), the layered method (detector). The novel methods and detectors were applied to scanning electron microscopy (SEM) and a novel instrument is successfully developed, the layered perspective instrument
  • Keywords
    electron beam applications; insulating materials; integrated circuits; scanning electron microscopy; semiconductor materials; sensors; silicon compounds; SEM; Si3N4-SiO2; detector; electron beam nondestructive microscopic layered method; electron beam nondestructive microscopic perspective method; insulator layer; integrated circuits; layered perspective instrument; penetrating surface method; scanning electron microscopy; semiconductor materials; Application specific integrated circuits; Detectors; Insulation; Integrated circuit manufacture; Integrated circuit technology; Microstructure; Physics; Scanning electron microscopy; Semiconductor device manufacture; Semiconductor materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
  • Conference_Location
    Guilin
  • Print_ISBN
    1-4244-0401-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2006.335289
  • Filename
    4134672