DocumentCode :
2045821
Title :
Controlling growth of aligned carbon nanotube bundles arrays with microwave plasma CVD
Author :
Liu, J.B. ; Deng, S.Z. ; Xu, N.S. ; Chen, Jun ; Ke, Y.L.
Author_Institution :
State Key Lab. of Optoelectron. Mater. & Technol., Zhongshan Univ., Guangzhou
fYear :
2006
fDate :
38899
Firstpage :
493
Lastpage :
494
Abstract :
A method was employed to improve the growth condition of carbon nanotube (CNT) in microwave plasma CVD system. Plasma etching on silicon substrates was avoided effectively. CNT bundles arrays were synthesized and the CNTs were vertical to the substrate
Keywords :
carbon nanotubes; nanotechnology; plasma CVD; C; Si; aligned carbon nanotube bundles arrays; chemical vapor deposition; growth condition; microwave plasma CVD; silicon substrates; Carbon nanotubes; Etching; Iron; Magnetic materials; Microwave antenna arrays; Photonic crystals; Plasma applications; Plasma materials processing; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location :
Guilin
Print_ISBN :
1-4244-0401-0
Type :
conf
DOI :
10.1109/IVNC.2006.335292
Filename :
4134675
Link To Document :
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