Title :
Advances in Specimen Preparation for Atom Probe Tomography
Author :
Larson, D.J. ; Thompson, K. ; Lawrence, D. ; Kostrna, S.L.P. ; Prosa, T.J. ; Ulfig, R.M. ; Kelly, T.F.
Author_Institution :
Imago Sci. Instrum. Corp., Madison, WI
Abstract :
This paper presents several advances made in the areas of 1) automated electropolishing of metals, 2) specimen preparation for grain boundary analysis, 3) site-specific specimen preparation for semiconductor devices, and 4) low-energy focused ion beam (FIB) milling to reduce the extent of ion-induced damage during the generic FIB preparation process
Keywords :
electrolytic polishing; focused ion beam technology; grain boundaries; ion beam effects; metals; milling; semiconductor devices; specimen preparation; tomography; atom probe tomography; electropolishing; grain boundary analysis; low-energy focused ion beam milling; metals; semiconductor devices; specimen preparation; Electrons; Focusing; Geometry; Grain boundaries; Instruments; Ion beams; Milling; Probes; Tomography; Voltage;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location :
Guilin
Print_ISBN :
1-4244-0401-0
DOI :
10.1109/IVNC.2006.335333
