• DocumentCode
    2047340
  • Title

    Microstructural evolution in Sn/Pb solder and Pd/Ag thick film conduction metallization

  • Author

    Duh, J.G. ; Liu, K.C.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • fYear
    1991
  • fDate
    11-16 May 1991
  • Firstpage
    653
  • Lastpage
    657
  • Abstract
    Intermetallic compound formation between thick-film mixed bonded conductor and Sn/Pb solder is investigated. Microstructural evolution of the interfacial morphology, and elemental and phase distribution are probed with the aid of electron microscopy and X-ray diffraction. Mechanical interlocking between the conductor and the substrate is shown to exist. Penetration of Bi element into the substrate is observed. Decrease in adhesion strength occurs when the sample is aged at 130°C for a long period of time. Microstructural analysis reveals the formation of the intermetallic compounds Pd3Sn, Pd2 Sn, Pd3Sn2, PdSn, Pd3Pb, Ag5 Sn, and Ag3Sn. The grain growth of the compounds after aging is also observed. It is argued that conductor swelling caused by tin diffusion into the conductor film and volume change caused by the intermetallic formation are the major reasons for the degradation of the peel strength
  • Keywords
    X-ray diffraction examination of materials; adhesion; electron microscopy; lead alloys; soldering; tin alloys; 130 degC; PdAg metallisation; SnPb solder; X-ray diffraction; adhesion strength; ageing; conductor swelling; degradation; electron microscopy; grain growth; interfacial morphology; intermetallic compounds; mechanical interlocking; peel strength; thick-film mixed bonded conductor; Aging; Bonding; Conductive films; Conductors; Electrons; Intermetallic; Morphology; Substrates; Thick films; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 1991. Proceedings., 41st
  • Conference_Location
    Atlanta, GA
  • Print_ISBN
    0-7803-0012-2
  • Type

    conf

  • DOI
    10.1109/ECTC.1991.163949
  • Filename
    163949