• DocumentCode
    2048137
  • Title

    The vacuum arc discharge in anode material vapour

  • Author

    Pavlenko, V.N. ; Panchenko, V.G.

  • Author_Institution
    Inst. for Nucl. Res., Kiev, Ukraine
  • fYear
    1997
  • fDate
    19-22 May 1997
  • Firstpage
    205
  • Abstract
    Summary form only given, as follows. In our experiments a discharge gas is formed between the thermionic cathode and water-cooled anode. Al, Cu, Ni, Cr, Ti, Ta, Mo, B, C, W are embedded on the anode as a working substance. Using the cylindrical electrode and electromagnetic system there is the possibility for creating transverse electric and magnetic fields. It is shown that the plasma-flow ionization coefficient may reach the value up to 80%. Thus the data presented in this paper (high ionization coefficient, charge-compensated plasma flow) demonstrate the perspective of wide practical utilization of such type of discharge for creation of thin high-adhesive films.
  • Keywords
    anodes; cathodes; electric fields; ionisation; magnetic fields; plasma flow; vacuum arcs; Al; B; C; Cr; Cu; Mo; Ni; Ta; Ti; W; anode material vapour; charge-compensated plasma flow; cylindrical electrode; electromagnetic system; plasma-flow ionization coefficient; thermionic cathode; thin high-adhesive films; transverse electric fields; transverse magnetic fields; vacuum arc discharge; water-cooled anode; Anodes; Arc discharges; Cathodes; Chromium; Electrodes; Electromagnetic fields; Ionization; Magnetic fields; Plasmas; Vacuum arcs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.606098
  • Filename
    606098