DocumentCode :
2048616
Title :
Polyimide copper thin film redistribution on glass ceramic/copper multilevel substrates
Author :
Redmond, T.F. ; Prasad, C. ; Walker, G.A.
Author_Institution :
IBM Corp., Hopewell Junction, NY, USA
fYear :
1991
fDate :
11-16 May 1991
Firstpage :
689
Lastpage :
692
Abstract :
The first-level package developed for Models 820 and 900 of the IBM ES9000 system family combines polymide copper thin-film technology with glass-ceramic technology to provide high wiring density and excellent electrical performance. The realization of the design application of the technology of the IBM ES9000 resulted in the development of several thin-film technologies for packaging. Some of these are: a photolith expose strategy to match the irregular image of a sintered ceramic substrate to a regular photolithographic grid; a reliable, planar layer interconnection structure based on an application of projection laser ablation technology; a novel redundant wiring structure which provides both high yield wiring and terminal metal structures; and a comprehensive, reliable repair strategy
Keywords :
IBM computers; mainframes; packaging; wiring; IBM ES9000 system family; IBM computers; Model 820; Model 900; electrical performance; first-level package; glass-ceramic technology; mainframes; photolith expose strategy; planar layer interconnection structure; polymide copper thin-film technology; projection laser ablation technology; redundant wiring structure; repair strategy; wiring density; Ceramics; Copper; Glass; Laser ablation; Laser applications; Packaging; Polyimides; Substrates; Transistors; Wiring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 1991. Proceedings., 41st
Conference_Location :
Atlanta, GA
Print_ISBN :
0-7803-0012-2
Type :
conf
DOI :
10.1109/ECTC.1991.163955
Filename :
163955
Link To Document :
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