DocumentCode :
2048894
Title :
A design platform for 90-nm leakage reduction techniques
Author :
Royannez, Philippe ; Mair, Hugh ; Dahan, Franck ; Wagner, Mike ; Streeter, Mark ; Bouetel, Laurent ; Blasquez, Joel ; Clasen, H. ; Semino, G. ; Dong, Julie ; Scott, D. ; Pitts, B. ; Raibaut, Claudine ; Ko, Uming
Author_Institution :
Texas Instruments, Villeneuve, France
fYear :
2005
fDate :
13-17 June 2005
Firstpage :
549
Lastpage :
550
Abstract :
Methodology, EDA flow, scripts, and documentation play a tremendous role in the deployment and standardization of advanced design techniques. In this paper we focus not only on leakage reduction techniques but also on their deployment as a worldwide infrastructure as the added-value resides not only in the techniques themselves but also in the way they are implemented to build an efficient, re-usable, robust, low cost and portable platform. Techniques have been silicon proven on the 90-nm TI CMOS technology and is commonly used to design SoC with complexities over 100 million transistors.
Keywords :
CMOS digital integrated circuits; digital integrated circuits; integrated circuit design; leakage currents; system-on-chip; 90 nm; CMOS technology; SoC design; leakage power management; leakage reduction; wireless application processor; Application software; CMOS technology; Diodes; Electronic design automation and methodology; Energy management; Graphics; Libraries; Logic; Power control; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2005. Proceedings. 42nd
Print_ISBN :
1-59593-058-2
Type :
conf
DOI :
10.1109/DAC.2005.193870
Filename :
1510390
Link To Document :
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