• DocumentCode
    2048994
  • Title

    Infrared spectroscopic study on hydrogen plasma induced surface reaction

  • Author

    Shinohara, Masanori ; Kawakami, Taka-aki ; Hara, Kojiro ; Fujiyama, Hiroshi ; Matsuda, Yoshinobu ; Nitta, Yuki ; Nakatani, Tatsuyuki

  • Author_Institution
    Grad. Sch. of Sci. & Technol., Nagasaki Univ., Nagasaki, Japan
  • fYear
    2010
  • fDate
    21-24 Nov. 2010
  • Firstpage
    1948
  • Lastpage
    1950
  • Abstract
    We used infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS) to investigate the reactions of hydrogen plasma with Si crystal. By hydrogen plasma exposure hydrogen was inserted into the Si crystal, with the changes in the atomic arrangements of Si crystal.
  • Keywords
    elemental semiconductors; hydrogen; infrared spectra; plasma chemistry; plasma diagnostics; plasma materials processing; silicon; H2; Si; atomic arrangements; hydrogen plasma induced surface reaction; infrared spectroscopy; multiple internal reflection geometry; Si; hydrogen plasma; infrared spectroscopy; insertion;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TENCON 2010 - 2010 IEEE Region 10 Conference
  • Conference_Location
    Fukuoka
  • ISSN
    pending
  • Print_ISBN
    978-1-4244-6889-8
  • Type

    conf

  • DOI
    10.1109/TENCON.2010.5686458
  • Filename
    5686458
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2048994