Title :
Infrared spectroscopic study on hydrogen plasma induced surface reaction
Author :
Shinohara, Masanori ; Kawakami, Taka-aki ; Hara, Kojiro ; Fujiyama, Hiroshi ; Matsuda, Yoshinobu ; Nitta, Yuki ; Nakatani, Tatsuyuki
Author_Institution :
Grad. Sch. of Sci. & Technol., Nagasaki Univ., Nagasaki, Japan
Abstract :
We used infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS) to investigate the reactions of hydrogen plasma with Si crystal. By hydrogen plasma exposure hydrogen was inserted into the Si crystal, with the changes in the atomic arrangements of Si crystal.
Keywords :
elemental semiconductors; hydrogen; infrared spectra; plasma chemistry; plasma diagnostics; plasma materials processing; silicon; H2; Si; atomic arrangements; hydrogen plasma induced surface reaction; infrared spectroscopy; multiple internal reflection geometry; Si; hydrogen plasma; infrared spectroscopy; insertion;
Conference_Titel :
TENCON 2010 - 2010 IEEE Region 10 Conference
Conference_Location :
Fukuoka
Print_ISBN :
978-1-4244-6889-8
DOI :
10.1109/TENCON.2010.5686458
