• DocumentCode
    2049423
  • Title

    Growth stimulation of radish sprouts using discharge plasmas

  • Author

    Kitazaki, Satoshi ; Yamashita, Daisuke ; Matsuzaki, Hidefumi ; Uchida, Giichirou ; Koga, Kazunori ; Shiratani, Masaharu ; Hayashi, Nobuya

  • Author_Institution
    Grad. Sch. of Inf. Sci. & Electr., Kyushu Univ., Fukuoka, Japan
  • fYear
    2010
  • fDate
    21-24 Nov. 2010
  • Firstpage
    1960
  • Lastpage
    1963
  • Abstract
    We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15-60% longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.
  • Keywords
    biological effects of radiation; biological techniques; botany; crops; discharges (electric); plasma applications; growth stimulation mechanism; low pressure O<;sub>;2<;/sub>; RF discharge plasmas; nonthermal atmospheric pressure He discharge plasmas; radish sprout growth stimulation; radish sprout seeds; reactive oxygen species; time 7 day; nonthrmal atomospheric pressure discharge; plasma biotechnology; reactive oxygen spieces;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TENCON 2010 - 2010 IEEE Region 10 Conference
  • Conference_Location
    Fukuoka
  • ISSN
    pending
  • Print_ISBN
    978-1-4244-6889-8
  • Type

    conf

  • DOI
    10.1109/TENCON.2010.5686474
  • Filename
    5686474
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2049423