DocumentCode :
2049571
Title :
Degradation effects in a-Si:H thin film transistors and their impact on circuit performance
Author :
Allee, David R. ; Clark, Lawrence T. ; Shringarpure, Rahul ; Venugopal, Sameer M. ; Li, Zi P. ; Bawolek, Edward J.
Author_Institution :
Flexible Display Center, Arizona State Univ., Tempe, AZ
fYear :
2008
fDate :
April 27 2008-May 1 2008
Firstpage :
158
Lastpage :
167
Abstract :
Amorphous silicon thin film transistors degrade with electrical stress. In particular, the threshold voltage increases significantly with positive gate voltages. The characteristics and mechanisms of the degradation are reviewed. The implications for various types of circuitry including active matrix backplanes, integrated drivers and general purpose digital circuitry are examined. A circuit modeling tool that enables the prediction of complex circuit degradation is presented. Finally, the similarity of degradation in amorphous silicon to negative bias temperature instability in crystalline PMOS is discussed along with potential approaches to reducing the degradation effects.
Keywords :
MOS digital integrated circuits; MOSFET; elemental semiconductors; hydrogen; silicon; thin film transistors; Si:H; active matrix backplanes; amorphous silicon thin film transistors; circuit modeling tool; complex circuit degradation; crystalline PMOS; electrical stress; gate voltages; general purpose digital circuitry; integrated drivers; negative bias temperature instability; threshold voltage; Amorphous silicon; Backplanes; Circuit optimization; Degradation; Driver circuits; Negative bias temperature instability; Predictive models; Stress; Thin film transistors; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
Conference_Location :
Phoenix, AZ
Print_ISBN :
978-1-4244-2049-0
Electronic_ISBN :
978-1-4244-2050-6
Type :
conf
DOI :
10.1109/RELPHY.2008.4558878
Filename :
4558878
Link To Document :
بازگشت