Title :
Fabrication tolerance study on mode-coupling-based polarization rotators
Author :
Bing Liu ; Ping Shum ; Jing Zhang ; Guo-Qiang Lo
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
Abstract :
In this paper, fabrication tolerance of two mode-coupling-based polarization rotators, slanted-angle polarization rotator and asymmetric sidewall polarization rotator, is studied and compared based on BPM and three-dimensional FDTD simulations. Optimization on both structures has achieved over 20 dB polarization extinction ratio with short rotation length. The effects of variation on rotation length, waveguide width, etched depth and width during fabrication are reported.
Keywords :
finite difference time-domain analysis; light polarisation; optical waveguides; BPM; asymmetric sidewall polarization rotator; etched depth; fabrication tolerance study; mode coupling-based polarization rotators; polarization extinction ratio; rotation length; slanted-angle polarization rotator; three-dimensional FDTD simulations; waveguide width; Finite difference methods; Helium; Optical device fabrication; Optical waveguides; Optimized production technology; Silicon; Polarization rotator; extinction ratio; photonic device; silicon waveguide;
Conference_Titel :
Communication Systems (ICCS), 2010 IEEE International Conference on
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-7004-4
DOI :
10.1109/ICCS.2010.5686486
