Fabrication tolerance study on mode-coupling-based polarization rotators

Author

Bing Liu ; Ping Shum ; Jing Zhang ; Guo-Qiang Lo

Author_Institution

Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore

fYear

2010

fDate

17-19 Nov. 2010

Firstpage

681

Lastpage

684

Abstract

In this paper, fabrication tolerance of two mode-coupling-based polarization rotators, slanted-angle polarization rotator and asymmetric sidewall polarization rotator, is studied and compared based on BPM and three-dimensional FDTD simulations. Optimization on both structures has achieved over 20 dB polarization extinction ratio with short rotation length. The effects of variation on rotation length, waveguide width, etched depth and width during fabrication are reported.

Keywords

finite difference time-domain analysis; light polarisation; optical waveguides; BPM; asymmetric sidewall polarization rotator; etched depth; fabrication tolerance study; mode coupling-based polarization rotators; polarization extinction ratio; rotation length; slanted-angle polarization rotator; three-dimensional FDTD simulations; waveguide width; Finite difference methods; Helium; Optical device fabrication; Optical waveguides; Optimized production technology; Silicon; Polarization rotator; extinction ratio; photonic device; silicon waveguide;

fLanguage

English

Publisher

ieee

Conference_Titel

Communication Systems (ICCS), 2010 IEEE International Conference on

Conference_Location

Singapore

Print_ISBN

978-1-4244-7004-4

Type

conf

DOI

10.1109/ICCS.2010.5686486

Filename

5686486