• DocumentCode
    2049864
  • Title

    Real-time current density imaging of electromigration processes using scanning magnetoresistive microscopy

  • Author

    Schrag, B.D. ; Gang Xiao

  • Author_Institution
    Dept. of Phys., Brown Univ., Providence, RI, USA
  • fYear
    2003
  • fDate
    March 30 2003-April 3 2003
  • Lastpage
    15
  • Abstract
    Recently, we have successfully demonstrated the use of scanning magnetoresistance microscopy (SMRM) to directly image electrical current densities at sub-micron length scales. One promising application of this technique is the imaging of electro migration (EM) failure modes in current-carrying interconnects at elevated temperatures. We have designed and demonstrated a technique capable of real-time observation of current flow in passivated conductors undergoing EM processes at length scales <100 nm. In this presentation, we will explain the details of the technique and present results from relevant physical systems.
  • Keywords
    copper; current density; electromigration; interconnections; magnetoresistance; metallic thin films; scanning electron microscopy; 100 nm; Cu; current flow; current-carrying interconnects; electrical current density; electromigration; failure modes; passivated conductors; real-time current density imaging; scanning magnetoresitive microscopy; Conductors; Copper; Current density; Electromigration; Immune system; Magnetic force microscopy; Magnetic sensors; Magnetoresistance; Testing; Videos;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2003. INTERMAG 2003. IEEE International
  • Conference_Location
    Boston, MA, USA
  • Print_ISBN
    0-7803-7647-1
  • Type

    conf

  • DOI
    10.1109/INTMAG.2003.1230599
  • Filename
    1230599