DocumentCode :
2049864
Title :
Real-time current density imaging of electromigration processes using scanning magnetoresistive microscopy
Author :
Schrag, B.D. ; Gang Xiao
Author_Institution :
Dept. of Phys., Brown Univ., Providence, RI, USA
fYear :
2003
fDate :
March 30 2003-April 3 2003
Lastpage :
15
Abstract :
Recently, we have successfully demonstrated the use of scanning magnetoresistance microscopy (SMRM) to directly image electrical current densities at sub-micron length scales. One promising application of this technique is the imaging of electro migration (EM) failure modes in current-carrying interconnects at elevated temperatures. We have designed and demonstrated a technique capable of real-time observation of current flow in passivated conductors undergoing EM processes at length scales <100 nm. In this presentation, we will explain the details of the technique and present results from relevant physical systems.
Keywords :
copper; current density; electromigration; interconnections; magnetoresistance; metallic thin films; scanning electron microscopy; 100 nm; Cu; current flow; current-carrying interconnects; electrical current density; electromigration; failure modes; passivated conductors; real-time current density imaging; scanning magnetoresitive microscopy; Conductors; Copper; Current density; Electromigration; Immune system; Magnetic force microscopy; Magnetic sensors; Magnetoresistance; Testing; Videos;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7647-1
Type :
conf
DOI :
10.1109/INTMAG.2003.1230599
Filename :
1230599
Link To Document :
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