DocumentCode
2049928
Title
The magnetic reversal study of permalloy micro domains
Author
Huang, Y.W. ; Lo, C.K. ; Yao, Y.D. ; Jeng, T.R. ; Ju, J.J.
Author_Institution
Dept. of Mater. Sci. & Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear
2003
fDate
March 30 2003-April 3 2003
Lastpage
17
Abstract
In this work we using e-beam lithography to define a sub micron magnetic cell with different shape one a metal line which can pass current through it, MFM was employed to observe the magnetization reversal at remanent state and the "writing" process. An array of nine cells were seated on the current line, and the uniformity and proximity of the field produced by current can also be studied.
Keywords
Permalloy; ferromagnetic materials; magnetic domains; magnetic force microscopy; magnetic thin films; magnetisation reversal; micromagnetics; remanence; FeNi; MFM; e-beam lithography; magnetization reversal; permalloy microdomains; remanent state; sub micron magnetic cell; Coercive force; Gold; Insulation; Lithography; Magnetic domains; Magnetic force microscopy; Magnetic forces; Magnetization; Shape; Strips;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7647-1
Type
conf
DOI
10.1109/INTMAG.2003.1230601
Filename
1230601
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