Fabrication of Optical Meta-structure at Infrared Rang using Nanoimprint Lithography

Summary form only as given. Negative index meta-materials (NIM) that exhibit unique refractive and focusing properties have recently become a focus of research worldwide. They have opened up new opportunities in nano-photonics and optical integration.1´8 The important issue of how to fabricate these meta-structures with high-precision, high-throughput, and low-cost remains a challenge, especially for short wavelengths of radiation (e.g. infrared or even visible range). Here, we report on the development of a fabrication procedure of optical meta-structures using nanoimprint lithography (NIL)9.