• DocumentCode
    2050231
  • Title

    A comparative study of reliability and performance of strain engineering using CESL stressor and mechanical strain

  • Author

    Lee, Kyong Taek ; Kang, Chang Yong ; Yoo, Ook Sang ; Chadwin, D. ; Bersuker, Gennadi ; Park, Ho Kyung ; Lee, Jun Myung ; Hwang, Hyung Sang ; Young, Chadwin D. ; Lee, Hi-Deok ; Jeong, Yoon-Ha

  • Author_Institution
    SEMATECH, Austin, TX
  • fYear
    2008
  • fDate
    April 27 2008-May 1 2008
  • Firstpage
    306
  • Lastpage
    309
  • Abstract
    Effects of a stressor nitride layer on device performance and reliability are investigated. To decouple intrinsic mechanical stress and process-related effects, device characteristics under mechanical bending stress and stressor layers were compared. The compressive stressor device exhibits improved initial interface quality, although slightly degraded reliability characteristics, due to increased hydrogen passivation of the dielectric/substrate interface. Thereby, the hydrogen passivation in the interface is found to be a primary cause of the difference in reliability characteristics.
  • Keywords
    MOSFET; bending; charge injection; compressive strength; hafnium compounds; high-k dielectric thin films; hot carriers; interface structure; internal stresses; passivation; semiconductor device reliability; titanium compounds; HfON; NMOSFET; PMOSFET; TiN-Si; compressive stressor device; device performance; device reliability; dielectric-substrate interface; hot carrier injection; hydrogen passivation; interfacial defects; intrinsic mechanical stress; mechanical bending stress; nitride contact etch stop layer stressor; positive bias temperature instability; strain engineering; stressor nitride layer; Annealing; Capacitive sensors; Compressive stress; Dielectric substrates; Hydrogen; MOS devices; MOSFETs; Passivation; Reliability engineering; Tensile stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
  • Conference_Location
    Phoenix, AZ
  • Print_ISBN
    978-1-4244-2049-0
  • Electronic_ISBN
    978-1-4244-2050-6
  • Type

    conf

  • DOI
    10.1109/RELPHY.2008.4558902
  • Filename
    4558902