Title :
A capacitance reliability degradation mechanism in Hyper-abrupt junction varactors
Author :
Abadeer, W. ; Rassel, R. ; Johnson, J.B.
Author_Institution :
IBM Syst. & Technol. Group, Essex Junction, VT
fDate :
April 27 2008-May 1 2008
Abstract :
Junction varactors form key passive components for RF and analog application where capacitance could be tuned by a control voltage. This paper details and models a reliability degradation mechanism due to electron trapping at the side of shallow trench isolation (STI) of the varactor, leading to systematic capacitance degradation as function of time and stress conditions. A key dimension which controls this mechanism is the anode width or spacing between STI, where a minimum value should be defined to meet reliability targets.
Keywords :
capacitance; electron traps; isolation technology; semiconductor device reliability; varactors; anode spacing; anode width; capacitance; electron trapping; hyper-abrupt junction varactors; reliability degradation mechanism; shallow trench isolation; Anodes; Capacitance; Capacitors; Charge carriers; Degradation; Doping profiles; P-n junctions; Stress; Varactors; Voltage;
Conference_Titel :
Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
Conference_Location :
Phoenix, AZ
Print_ISBN :
978-1-4244-2049-0
Electronic_ISBN :
978-1-4244-2050-6
DOI :
10.1109/RELPHY.2008.4558903