Application of the LIGA process for fabrication of gas avalanche devices

Author

Kim, H.K. ; Jackson, K. ; Hong, W.S. ; Park, I.J. ; Han, S.H. ; Kadyk, J. ; Perez-Mandez, V. ; Wenzel, W. ; Cho, G.

Author_Institution

Div. of Phys., Lawrence Berkeley Lab., CA, USA

Volume

2

fYear

1999

fDate

1999

Firstpage

633

Abstract

Arrays of holes having steep wall sides have been successfully prepared by using a deep X-ray lithography technique, or LIGA process, on various thicknesses (50-1000 μm) polymethylmethacrylate (PMMA) plastic sheets. Electrical contact layers onto the top and bottom sides were deposited by metal evaporation in a vacuum. The completed LIGA devices were studied as an alternative design of the gas electron multiplier (GEM). The first measurements of performance were very promising: a lower limit to the avalanche gain of ~3,000 was obtained, and the actual gain is probably much larger. Detailed experimental results and field simulations will be described in this study. In addition, an application of a LIGA device to serve as a drift plane electrode, avoiding the angle dependency, will be discussed

Keywords

LIGA; amplification; electrical contacts; particle detectors; 50 to 1000 micron; LIGA; PMMA sheet; avalanche gain; deep X-ray lithography; drift plane electrode; electrical contact; gain; gas avalanche devices; holes; Dielectrics and electrical insulation; Electrodes; Electron multipliers; Fabrication; Gas insulation; Light sources; Performance gain; Physics; Resists; X-ray lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Nuclear Science Symposium, 1999. Conference Record. 1999 IEEE

Conference_Location

Seattle, WA

ISSN

1082-3654

Print_ISBN

0-7803-5696-9

Type

conf

DOI

10.1109/NSSMIC.1999.845749

Filename

845749