DocumentCode :
2050775
Title :
Application of the LIGA process for fabrication of gas avalanche devices
Author :
Kim, H.K. ; Jackson, K. ; Hong, W.S. ; Park, I.J. ; Han, S.H. ; Kadyk, J. ; Perez-Mandez, V. ; Wenzel, W. ; Cho, G.
Author_Institution :
Div. of Phys., Lawrence Berkeley Lab., CA, USA
Volume :
2
fYear :
1999
fDate :
1999
Firstpage :
633
Abstract :
Arrays of holes having steep wall sides have been successfully prepared by using a deep X-ray lithography technique, or LIGA process, on various thicknesses (50-1000 μm) polymethylmethacrylate (PMMA) plastic sheets. Electrical contact layers onto the top and bottom sides were deposited by metal evaporation in a vacuum. The completed LIGA devices were studied as an alternative design of the gas electron multiplier (GEM). The first measurements of performance were very promising: a lower limit to the avalanche gain of ~3,000 was obtained, and the actual gain is probably much larger. Detailed experimental results and field simulations will be described in this study. In addition, an application of a LIGA device to serve as a drift plane electrode, avoiding the angle dependency, will be discussed
Keywords :
LIGA; amplification; electrical contacts; particle detectors; 50 to 1000 micron; LIGA; PMMA sheet; avalanche gain; deep X-ray lithography; drift plane electrode; electrical contact; gain; gas avalanche devices; holes; Dielectrics and electrical insulation; Electrodes; Electron multipliers; Fabrication; Gas insulation; Light sources; Performance gain; Physics; Resists; X-ray lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nuclear Science Symposium, 1999. Conference Record. 1999 IEEE
Conference_Location :
Seattle, WA
ISSN :
1082-3654
Print_ISBN :
0-7803-5696-9
Type :
conf
DOI :
10.1109/NSSMIC.1999.845749
Filename :
845749
Link To Document :
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