DocumentCode :
2051592
Title :
Improved Dual-Axis Micro Gyroscope Using a Commercially Available Fabrication Processes
Author :
Chang, Kaicheng ; Liu, Wen Yuan
Author_Institution :
Ind. Technol. Res. Inst.
fYear :
2006
fDate :
18-21 Jan. 2006
Firstpage :
66
Lastpage :
69
Abstract :
A second generation ITRI micro gyroscope design is designed, fabricated, and tested. Major improvements over the original design include using thin film metallization techniques to increase the proof mass to 9.32 times 10-7g for the 500 times 500 mum2 gyro structure, and demonstrating an integrated package with a CMOS ASIC die. The custom-built, capacitance-to-voltage converter ASIC has a calculated noise floor of 6.5times10-7 V/Hz-2 at 19 KHz, a full-scale range of 5 fF, and a target resolution of 5 aF. The gyroscope has a fundamental actuation frequency at 4.33 KHz, with a quality factor of 22.5 under atmospheric conditions
Keywords :
CMOS integrated circuits; application specific integrated circuits; gyroscopes; metallisation; microassembling; micromechanical devices; 19 kHz; 4.33 kHz; 5 fF; CMOS ASIC die; ITRI microgyroscope; MEMS; capacitance-to-voltage converter ASIC; dual-axis microgyroscope; gyro structure; integrated package; thin film metallization; Application specific integrated circuits; Capacitance; Fabrication; Frequency; Gyroscopes; Metallization; Packaging; Q factor; Testing; Transistors; MEMS; dual-axis; gyroscope;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on
Conference_Location :
Zhuhai
Print_ISBN :
1-4244-0139-9
Electronic_ISBN :
1-4244-0140-2
Type :
conf
DOI :
10.1109/NEMS.2006.334623
Filename :
4134905
Link To Document :
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