Title :
Micro Hot Embossing Metal Mold For Microfluidic Chip Based On No Back Plate Growing Method
Author :
Du, Liqun ; Liu, Chong ; Liu, Haijun ; Qin, Jiang ; Wei, Yuanjie
Author_Institution :
Key Lab. for Precision & Non-traditional Machining Technol. of Minist. of Educ., Dalian Univ. of Technol.
Abstract :
This paper presents a novel microfabrication technology of micro hot embossing metal mold - no back plate growing method. Micro metal mold is fabricated by low-cost UV-LIGA surface micro fabrication process using negative thick photoresist, SU-8. Different from other micro hot embossing molds, the micro mold with vertical sidewalls is fabricated by micro nickel electroforming directly on nickel substrate. Because of no back plate growing demand, time of nickel electroforming decrease greatly. This takes advantages not only short produce cycle and low cost, but also high precision of micro mold. Based on the micro nickel mold and automation fabrication system, high precision and mass-producing microfluidic chips have been fabricated. Uniformity of width and height of micro mold is discussed. Thermal expansion and swelling of SU-8 structure at high temperature and at room temperature have also been investigated in the paper. From the experiment results of thermal expansion and swelling, it can be seen that thermal expansion of SU-8 structure affects the width of micro mold after nickel electroforming considerably
Keywords :
LIGA; embossing; microfluidics; nickel; photoresists; thermal expansion; 293 to 298 K; SU-8 photoresist; UV-LIGA process; microelectroforming; microfluidic chip; microhot embossing metal mold; micronickel electroforming; micronickel mold; negative thick photoresist; surface microfabrication process; thermal expansion; Embossing; Fabrication; Microfluidics; Nickel; Polymers; Resists; Silicon; Substrates; Temperature; Thermal expansion; Micro Nickel mold; Micro electroforming; SU-8 photoresist; UV-LIGA process;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on
Conference_Location :
Zhuhai
Print_ISBN :
1-4244-0139-9
Electronic_ISBN :
1-4244-0140-2
DOI :
10.1109/NEMS.2006.334648