DocumentCode :
2052425
Title :
On the correlation between Static Noise Margin and Soft Error Rate evaluated for a 40nm SRAM cell
Author :
Vatajelu, Elena I. ; Tsiligiannis, G. ; Dilillo, L. ; Bosio, A. ; Girard, P. ; Pravossoudovitch, S. ; Todri, A. ; Virazel, A. ; Wrobel, F. ; Salgne, F.
Author_Institution :
LIRMM, Montpellier, France
fYear :
2013
fDate :
2-4 Oct. 2013
Firstpage :
143
Lastpage :
148
Abstract :
Technology scaling has brought forth major issues related to process variation such as circuit stability and reliability degradation, which are especially problematic for the Static Random Access Memories (SRAM). An accurate and fast estimation of memory reliability is required to ensure its correct operation under extreme conditions. For this reason, several metrics have been proposed, such as the Static Noise Margin (SNM), to evaluate the stability of the SRAM cell under static noise; and the Soft Error Rate (SER), to evaluate the reliability of the memory under radiation. While accurate in predicting the memory reliability, the cell´s SER estimation requires lengthy simulations for each cell configuration. On the other hand, a single simulation is necessary to estimate its SNM. For this reason, in this paper we analyze the possibility of using the classical SNM as a first estimator of SRAM cell´s reliability under neutron radiation while its transistors are affected by random threshold voltage (Vth) variation. A study based on stability sensitivity analysis to Vth variations leads to a new way of evaluating the SNM metric used to achieve high correlation between SNM and SER.
Keywords :
SRAM chips; circuit stability; SRAM cell reliability; cell SER estimation; cell configuration; circuit stability; classical SNM; lengthy simulations; memory reliability; neutron radiation; process variation; random threshold voltage variation; reliability degradation; single simulation; size 40 nm; soft error rate; stability sensitivity analysis; static noise margin; static random access memories; technology scaling; Discrete Fourier transforms; Fault tolerance; Fault tolerant systems; Nanotechnology; Very large scale integration; SER; SNM; SRAM; neutron radiation; process variability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Defect and Fault Tolerance in VLSI and Nanotechnology Systems (DFT), 2013 IEEE International Symposium on
Conference_Location :
New York City, NY
ISSN :
1550-5774
Print_ISBN :
978-1-4799-1583-5
Type :
conf
DOI :
10.1109/DFT.2013.6653597
Filename :
6653597
Link To Document :
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