DocumentCode :
2052524
Title :
Modeling of threshold voltage in three-dimensional SOI-structures
Author :
Kogut, I.T. ; Scherbyak, V.M.
fYear :
2010
fDate :
23-27 Feb. 2010
Firstpage :
360
Lastpage :
360
Abstract :
This paper proposed an original approach to the analysis of the threshold voltage metal-oxide-semiconductor structures based on local three-dimensional SOI-structures.
Keywords :
MOSFET; silicon-on-insulator; MOS-transistor; cylinder shaped gate; metal-oxide-semiconductor structures; three-dimensional SOI-structures; threshold voltage modeling; ¿-shaped profile gate; CMOS integrated circuits; Crystallization; Electric potential; Integrated circuit manufacture; Manufacturing industries; Manufacturing processes; Mathematical analysis; Mathematical model; Silicon; Threshold voltage; II-shaped profile gate; SOI MOS-transistor; cylinder shaped gate; three-dimensional SOI-structure; threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Modern Problems of Radio Engineering, Telecommunications and Computer Science (TCSET), 2010 International Conference on
Conference_Location :
Lviv-Slavske
Print_ISBN :
978-966-553-875-2
Electronic_ISBN :
978-966-553-901-8
Type :
conf
Filename :
5445980
Link To Document :
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