Title :
Supply signal fluctuations due to chip power grid resonance — a new reliability concern
Author :
Gurfinkel, M. ; Livshits, P. ; Rozen, A. ; Fefer, Y. ; Bernstein, J.B. ; Shapira, Yoram
Author_Institution :
Sch. of EE, Tel Aviv Univ., Tel Aviv
fDate :
April 27 2008-May 1 2008
Abstract :
On-die measurements of VDD and VSS signals inside a 90 nm technology chip are presented. The results show fluctuations in the VDD and VSS signals, which might constitute an important new reliability concern. These fluctuations also indirectly affect other reliability mechanisms, such as NBTI, HCI and TDDB. Simulations predict aggravation of this phenomenon for future technologies, which may prove to be a show stopper for further scaling.
Keywords :
fluctuations; integrated circuit reliability; nanotechnology; power grids; HCI; NBTI; TDDB; chip power grid resonance; integrated circuit reliability; nanotechnology chip; size 90 nm; supply signal fluctuations; CMOS technology; Fluctuations; Human computer interaction; Logic testing; Niobium compounds; Power grids; Resonance; Semiconductor device measurement; Titanium compounds; Voltage;
Conference_Titel :
Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
Conference_Location :
Phoenix, AZ
Print_ISBN :
978-1-4244-2049-0
Electronic_ISBN :
978-1-4244-2050-6
DOI :
10.1109/RELPHY.2008.4559006
