Title :
Current distribution in spinvalve multilayer films determined from in-situ conductance measurements
Author :
McCallum, A.T. ; Russek, S.E.
Author_Institution :
NIST, Boulder, CO, USA
fDate :
March 30 2003-April 3 2003
Abstract :
In this paper, the conductance of top pinned spinvalves was measured during deposition using a four point Van Der Pauw geometry. This measurement has submonolayer resolution. The layers in the spinvalve were Ta (5 nm)/NiFe(5 nm)/CoFe(1 nm)/Ru(0.6 nm)/CoFe(1.5 nm)/IrMn(8 nm)/Ta(5 nm). The thickness of the Cu layers were 2, 3, 4, 5, and 6 nm thick. The in-situ conductance data is given. The bulk conductivity of each layer in the spin valve was measured by growing a film where the layer was 30 nm thick and measuring the asymptotic conductivity.
Keywords :
cobalt alloys; copper; current distribution; electrical conductivity; iridium alloys; iron alloys; magnetic multilayers; magnetic thin films; manganese alloys; nickel alloys; ruthenium; spin valves; tantalum; 2 nm; 3 nm; 30 nm; 4 nm; 5 nm; 6 nm; Cu layer thickness; Ta-NiFe-CoFe-Cu-CoFe-Ru-CoFe-IrMn-Ta; asymptotic conductivity; bulk conductivity; current distribution; four point Van Der Pauw geometry; spin valve multilayer films; submonolayer resolution; top pinned spin valves; Conductive films; Conductivity measurement; Current distribution; Current measurement; Magnetic field measurement; Magnetic multilayers; Nonhomogeneous media; Physics; Reflection; Thickness measurement;
Conference_Titel :
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7647-1
DOI :
10.1109/INTMAG.2003.1230764