• DocumentCode
    2054114
  • Title

    Preperation of Alq3 Thin Films for Organic ElectroLuminescence using plasma ablation method

  • Author

    Kawasaki, Hiroharu ; Suda, Yoshiaki ; Ohshima, Tamiko ; Yagyu, Yoshihito

  • Author_Institution
    Sasebo Nat. Coll. of Technol., Nagasaki, Japan
  • fYear
    2010
  • fDate
    21-24 Nov. 2010
  • Firstpage
    2233
  • Lastpage
    2236
  • Abstract
    Organic electroluminescence thin films were prepared by pulsed laser deposition method using high density Alq3 (tris (8-hydroxyquinoline) aluminum) targets which produced by shock compaction technology. The experimental results suggest that Alq3 thin films can be deposited at high fluence above 2.3J/cm2. XPS results suggest that prepared Alq3 films have Al 2p peak, and the spectrum have peak shift caused by oxidation. UV-Vis spectrum shows that the prepared films have absorption around 400 nm. The results suggest that PLD method maybe one of the effective method to prepare high quality Alq3 films which work as organic electro-luminescence displays.
  • Keywords
    X-ray photoelectron spectra; aluminium compounds; electroluminescence; organic compounds; oxidation; plasma materials processing; pulsed laser deposition; thin films; ultraviolet spectra; visible spectra; (tris (8-hydroxyquinoline) aluminum); UV-vis spectra; XPS; absorption spectra; organic electroluminescence thin film preparation; oxidation; plasma ablation method; pulsed laser deposition; shock compaction technology; Organic electroluminescence film; Plasma processing; Pulsed laser deposition; plasma process;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TENCON 2010 - 2010 IEEE Region 10 Conference
  • Conference_Location
    Fukuoka
  • ISSN
    pending
  • Print_ISBN
    978-1-4244-6889-8
  • Type

    conf

  • DOI
    10.1109/TENCON.2010.5686661
  • Filename
    5686661