DocumentCode
2054114
Title
Preperation of Alq3 Thin Films for Organic ElectroLuminescence using plasma ablation method
Author
Kawasaki, Hiroharu ; Suda, Yoshiaki ; Ohshima, Tamiko ; Yagyu, Yoshihito
Author_Institution
Sasebo Nat. Coll. of Technol., Nagasaki, Japan
fYear
2010
fDate
21-24 Nov. 2010
Firstpage
2233
Lastpage
2236
Abstract
Organic electroluminescence thin films were prepared by pulsed laser deposition method using high density Alq3 (tris (8-hydroxyquinoline) aluminum) targets which produced by shock compaction technology. The experimental results suggest that Alq3 thin films can be deposited at high fluence above 2.3J/cm2. XPS results suggest that prepared Alq3 films have Al 2p peak, and the spectrum have peak shift caused by oxidation. UV-Vis spectrum shows that the prepared films have absorption around 400 nm. The results suggest that PLD method maybe one of the effective method to prepare high quality Alq3 films which work as organic electro-luminescence displays.
Keywords
X-ray photoelectron spectra; aluminium compounds; electroluminescence; organic compounds; oxidation; plasma materials processing; pulsed laser deposition; thin films; ultraviolet spectra; visible spectra; (tris (8-hydroxyquinoline) aluminum); UV-vis spectra; XPS; absorption spectra; organic electroluminescence thin film preparation; oxidation; plasma ablation method; pulsed laser deposition; shock compaction technology; Organic electroluminescence film; Plasma processing; Pulsed laser deposition; plasma process;
fLanguage
English
Publisher
ieee
Conference_Titel
TENCON 2010 - 2010 IEEE Region 10 Conference
Conference_Location
Fukuoka
ISSN
pending
Print_ISBN
978-1-4244-6889-8
Type
conf
DOI
10.1109/TENCON.2010.5686661
Filename
5686661
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