• DocumentCode
    2054288
  • Title

    Photoluminescence properties of hydrogenated amorphous silicon nitride

  • Author

    Kashio, Norihide ; Kato, Haruhisa ; Ohki, Y.

  • Author_Institution
    Waseda Univ., Tokyo
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    79
  • Lastpage
    82
  • Abstract
    We have investigated time-resolved PL spectra and nanosecond-order PL decay characteristics in silicon-rich a-SiNx:H film and discussed recombination processes of photogenerated carriers. The PL peak energy shifts to a higher energy as x increases. Time-resolved PL and nanosecond-order PL decay measurements indicate that the photogenerated carriers in the band-tail states recombine first through an exciton-like mechanism and then through a radiative tunneling mechanism as in the cases of near-stoichiometric and nitrogen-rich a-SiN x:H films
  • Keywords
    amorphous semiconductors; excitons; hydrogen; nonradiative transitions; photoluminescence; plasma CVD coatings; radiative lifetimes; semiconductor materials; semiconductor thin films; silicon compounds; spectral line shift; time resolved spectra; tunnelling; PL peak energy shift; SiN:H; band-tail states; exciton-like mechanism; hydrogenated amorphous silicon nitride; nanosecond-order PL decay; photogenerated carrier recombination processes; photoluminescence; radiative tunneling mechanism; silicon-rich a-SiNx:H film; time-resolved PL spectra; Amorphous silicon; Delay effects; Photoluminescence; Photonic band gap; Pulse measurements; Refractive index; Space vector pulse width modulation; Strontium; Tail; Time measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulating Materials, 2001. (ISEIM 2001). Proceedings of 2001 International Symposium on
  • Conference_Location
    Himeji
  • Print_ISBN
    4-88686-053-2
  • Type

    conf

  • DOI
    10.1109/ISEIM.2001.973568
  • Filename
    973568