Title :
Plasma CVD treatment for titanium dioxides to approach the high performance of photocatalysts by visible light irradiation
Author :
Yamamoto, Kazuya ; Matsuura, Yuki ; Nakamura, Ayako ; Sonoda, Tatsuhiko ; Matsushima, Shigenori ; Yamada, Kenji
Author_Institution :
Dept. of Mater. Sci. & Chem. Eng., Kitakyushu Nat. Coll. of Technol., Fuoka, Japan
Abstract :
TiO2 particles or casted thin films are treated with plasma CVD using the mixture of tantalum alkoxide and nitrogen gas or copper(II) acetylacetonate to improve the photocatalyst activities of TiO2 irradiated by visible light. The layer formed on the surface of the TiO2 after plasma treatment is composed of some species characterized by XPS measurement. The visible-light activity are shown after the plasma CVD treatment to the surface of TiO2.
Keywords :
X-ray photoelectron spectra; catalysts; photochemistry; plasma CVD; radiation effects; thin films; titanium compounds; TiO2; XPS; casted thin films; copper(II) acetylacetonate; nitrogen gas; photocatalysts; plasma CVD treatment; tantalum alkoxide; titanium dioxides; visible light irradiation; photocatalyst; plasma CVD treatment; titanium dioxide; visible light;
Conference_Titel :
TENCON 2010 - 2010 IEEE Region 10 Conference
Conference_Location :
Fukuoka
Print_ISBN :
978-1-4244-6889-8
DOI :
10.1109/TENCON.2010.5686668
