Title :
Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches
Author :
Nomura, Takuya ; Urakawa, Tatsuya ; Korenaga, Yuki ; Yamashita, Daisuke ; Matsuzaki, Hidefumi ; Koga, Kazunori ; Shiratani, Masaharu ; Setsuhara, Yuichi ; Sekine, Makoto ; Hori, Masaru
Author_Institution :
Grad. Sch. of Inf. Sci. & Electr. Eng., Kyushu Univ., Fukuoka, Japan
Abstract :
To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.
Keywords :
carbon; plasma CVD; thin films; C; CVD plasma deposition; anisotropic deposition; carbon films; substrate temperature; Raman spectroscopy; anisotropic deposition; carbon film; deposition profile; plasma CVD;
Conference_Titel :
TENCON 2010 - 2010 IEEE Region 10 Conference
Conference_Location :
Fukuoka
Print_ISBN :
978-1-4244-6889-8
DOI :
10.1109/TENCON.2010.5686688
