• DocumentCode
    2054848
  • Title

    Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches

  • Author

    Nomura, Takuya ; Urakawa, Tatsuya ; Korenaga, Yuki ; Yamashita, Daisuke ; Matsuzaki, Hidefumi ; Koga, Kazunori ; Shiratani, Masaharu ; Setsuhara, Yuichi ; Sekine, Makoto ; Hori, Masaru

  • Author_Institution
    Grad. Sch. of Inf. Sci. & Electr. Eng., Kyushu Univ., Fukuoka, Japan
  • fYear
    2010
  • fDate
    21-24 Nov. 2010
  • Firstpage
    2213
  • Lastpage
    2215
  • Abstract
    To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.
  • Keywords
    carbon; plasma CVD; thin films; C; CVD plasma deposition; anisotropic deposition; carbon films; substrate temperature; Raman spectroscopy; anisotropic deposition; carbon film; deposition profile; plasma CVD;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TENCON 2010 - 2010 IEEE Region 10 Conference
  • Conference_Location
    Fukuoka
  • ISSN
    pending
  • Print_ISBN
    978-1-4244-6889-8
  • Type

    conf

  • DOI
    10.1109/TENCON.2010.5686688
  • Filename
    5686688
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2054848