Title :
Nickel nanowire arrays based on imprint lithography
Author :
Nielsch, K. ; Choi, J. ; Hertel, R. ; Wehrspohn, R.B. ; Navas, D. ; Vazquez, M. ; Melle, S. ; Armelles, G. ; Fischer, S.F. ; Gosele, U.
Author_Institution :
Max-Planck-Inst. of Microstruct. Phys., Halle, Germany
fDate :
March 30 2003-April 3 2003
Abstract :
In this paper, the fabrication of Ni nanowire arrays based on imprint lithography will be presented, which show a perfect hexagonal arrangement on a cm/sup 2/-scale. Additionally, we will analyze experimentally as well as theoretically the influence of the degree of order of the Ni nanowire arrays on its magnetic properties.
Keywords :
Kerr magneto-optical effect; magnetic domains; nanolithography; nanowires; nickel; Al/sub 2/O/sub 3/; Ni; Si; hexagonal arrangement; imprint lithography; magnetic properties; nickel nanowire arrays; Artificial intelligence; Etching; Fabrication; Interference; Lithography; Magnetic analysis; Magnetic memory; Magnetic properties; Nickel; Wires;
Conference_Titel :
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7647-1
DOI :
10.1109/INTMAG.2003.1230802
