DocumentCode
2054877
Title
Thermally activated switching of small magnetic tunnel junctions
Author
Leuschner, R. ; Korenivski, V. ; Rooks, M. ; O´Sullivan, E. ; Wright, G. ; Trouilloud, P. ; Raberg, W. ; Lu, Y.
Author_Institution
Infineon Technol., Hopewell Junction, NY, USA
fYear
2003
fDate
March 30 2003-April 3 2003
Lastpage
12
Abstract
Small magnetic tunnel junctions were prepared and the magnetization reversal of their free layers was studied by applying high-speed reversal fields driven by pulsed currents. From the decay of the switching field with the number of pulses or the pulse length the thermal activation energy was deduced. Large cells (width>150 nm) showed a significant lower activation energy than expected from single-domain-theory, indicating non-uniform switching. Small cells (width /spl sim/ 90 nm and length 150 to 200 nm) could be well described by Stoner-Wohlfarth single domain model and single step switching with Arrhenius activation energy. For scaling of magnetic random access memories down to 100 nm this would indicate that a smaller free layer volume is to a large degree compensated by higher relative activation energy due to more uniform switching.
Keywords
magnetic switching; magnetic tunnelling; magnetisation reversal; 150 to 200 nm; 90 nm; Arrhenius activation energy; Stoner-Wohlfarth single domain model; magnetic random access memories; magnetic tunnel junctions; magnetization reversal; pulsed currents; single domain theory; thermal activation energy; thermally activated switching; Anisotropic magnetoresistance; Coaxial components; Copper; Lithography; Magnetic anisotropy; Magnetic switching; Magnetic tunneling; Perpendicular magnetic anisotropy; Switches; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7647-1
Type
conf
DOI
10.1109/INTMAG.2003.1230803
Filename
1230803
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