DocumentCode
2054966
Title
Effect of surface roughness on plasma oxidation behavior of Al layer and tunneling magnetoresistance
Author
Dong-Min Jeon ; Jin-Woo Park ; Seong-Yong Yoon ; Du-Hyun Lee ; Dae-Ho Yoon ; Su-Jeong Suh
Author_Institution
Adv. Mater. & Process Res. Center for IT, Sung Kyun Kwan Univ., Suwon, South Korea
fYear
2003
fDate
March 30 2003-April 3 2003
Abstract
In this paper, we evaluated the variation of magnetic properties and junction resistance R/sub j/. And the oxidation behavior was analyzed by a high resolution transmission microscopy (HR-TEM) study.
Keywords
aluminium; chromium; cobalt; coercive force; ferromagnetic materials; oxidation; plasma materials processing; surface roughness; transmission electron microscopy; tunnelling magnetoresistance; Al layer; Cr-Co-Al; HRTEM; high resolution transmission microscopy; junction resistance; magnetic properties; plasma oxidation; surface roughness; tunneling magnetoresistance; Current measurement; Degradation; Electric breakdown; Magnetic sensors; Magnetic tunneling; Oxidation; Plasma applications; Random access memory; Stress measurement; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7647-1
Type
conf
DOI
10.1109/INTMAG.2003.1230808
Filename
1230808
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