Title :
Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition
Author :
Kitagawa, Hiroaki ; Kan, Ryoji ; Mine, Kenji ; Shinohara, Masanori ; Matsuda, Yoshinobu
Author_Institution :
Grad. Sch. of Sci. & Technol., Nagasaki Univ., Nagasaki, Japan
Abstract :
Substrate energy flux in the inductively coupled plasma (ICP) assisted magnetron discharge has been measured by using a home-made thermal probe. The energy flux depends predominantly on the ICP power. In addition, substrate bias dependence of the substrate energy flux has been measured. As a result, it has been confirmed that the measured heat influx in an ICP is in good agreement with the theoretically calculated value within 30% error. Thus, substrate energy flux during the ICP assisted sputtering is quantitatively clarified.
Keywords :
discharges (electric); plasma materials processing; sputter deposition; substrates; surface energy measurement; ICP assisted sputter-deposition; ICP assisted sputtering; heat influx; home-made thermal probe; inductively coupled plasma assisted magnetron discharge; substrate bias; substrate energy flux; thermal probe measurements; Thermal probe; energy flux; inductively coupled plasma; transparent conductive film;
Conference_Titel :
TENCON 2010 - 2010 IEEE Region 10 Conference
Conference_Location :
Fukuoka
Print_ISBN :
978-1-4244-6889-8
DOI :
10.1109/TENCON.2010.5686695
