DocumentCode :
2055180
Title :
Integrated silicon waveguide for intra-chip communication: A practical experience
Author :
Ekekwe, Ndubuisi
Author_Institution :
Electr.&Comput. Eng., Johns Hopkins Univ., Baltimore, MD
fYear :
2007
fDate :
8-10 July 2007
Firstpage :
15
Lastpage :
18
Abstract :
This paper presents the design and fabrication of a waveguide in silicon using traditional microfabrication and manufacturing processes. Integrated waveguide has become important owing to the need for faster computing and the problems associated with copper as technology scales into the nanometer regime. Furthermore, photonic on-chip interconnect offers better latency, higher bandwidth capacity, power efficiency, faster speed and reduced interference when compared with electrical interconnect. To test the silicon waveguide, a Gb/s communication system was assembled and laser light was coupled and transmitted through the chip.
Keywords :
etching; ion implantation; lithography; optical waveguides; silicon; Si; electrical interconnect; etching; integrated silicon waveguide; intra-chip communication; ion implantation; laser light; lithography; microfabrication; photonic on-chip interconnect; power efficiency; Bandwidth; Copper; Delay; Interference; Manufacturing processes; Optical device fabrication; Power system interconnection; Silicon; System testing; Waveguide components;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics and Microsystems, 2007 International Students and Young Scientists Workshop on
Conference_Location :
Dresden
Print_ISBN :
978-1-4244-1313-3
Electronic_ISBN :
978-1-4244-1314-0
Type :
conf
DOI :
10.1109/STYSW.2007.4559115
Filename :
4559115
Link To Document :
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