Title :
Dry etching of AlTiC with CF/sub 4/ and H/sub 2/ for slider fabrication
Author :
Zhang, M.S. ; Hor, Y.S. ; Han, G.C. ; Liu Bo
Author_Institution :
Data Storage Inst., Singapore, Singapore
fDate :
March 30 2003-April 3 2003
Abstract :
In this paper, we investigated the effects of etching rate, selectivity and surface roughness. Because the AlTiC substrate consists of 2 phases Al/sub 2/O/sub 3/ and TiC, some phenomenon observed is different from a single phase substrate. The results of the etching surface analyzed by AFM are also reported. Finally, a femto slider etched by CF/sub 4/ and H/sub 2/ and its fly height test results are presented.
Keywords :
alumina; aluminium compounds; atomic force microscopy; etching; magnetic heads; substrates; surface morphology; surface roughness; titanium compounds; AFM; Al/sub 2/O/sub 3/; AlTiC; AlTiC substrate; TiC; dry etching; etching surface; slider fabrication; surface roughness; Argon; Artificial intelligence; Corrosion; Dry etching; Fabrication; Hydrogen; Magnetic heads; Plasma applications; Plasma measurements; Radio frequency;
Conference_Titel :
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7647-1
DOI :
10.1109/INTMAG.2003.1230834
