DocumentCode
2055568
Title
Dry etching of AlTiC with CF/sub 4/ and H/sub 2/ for slider fabrication
Author
Zhang, M.S. ; Hor, Y.S. ; Han, G.C. ; Liu Bo
Author_Institution
Data Storage Inst., Singapore, Singapore
fYear
2003
fDate
March 30 2003-April 3 2003
Lastpage
10
Abstract
In this paper, we investigated the effects of etching rate, selectivity and surface roughness. Because the AlTiC substrate consists of 2 phases Al/sub 2/O/sub 3/ and TiC, some phenomenon observed is different from a single phase substrate. The results of the etching surface analyzed by AFM are also reported. Finally, a femto slider etched by CF/sub 4/ and H/sub 2/ and its fly height test results are presented.
Keywords
alumina; aluminium compounds; atomic force microscopy; etching; magnetic heads; substrates; surface morphology; surface roughness; titanium compounds; AFM; Al/sub 2/O/sub 3/; AlTiC; AlTiC substrate; TiC; dry etching; etching surface; slider fabrication; surface roughness; Argon; Artificial intelligence; Corrosion; Dry etching; Fabrication; Hydrogen; Magnetic heads; Plasma applications; Plasma measurements; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7647-1
Type
conf
DOI
10.1109/INTMAG.2003.1230834
Filename
1230834
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